| Titel | Autoren | Quelle | Datum |
|---|---|---|---|
| Fully Printed Electrolyte-Gated Transistor Formed in a 3D Polymer Reservoir with Laser Printed Drain/Source Electrodes | G.C. Marques, L. Yang, Y. Liu, V. Wollersen, T. Scherer, B. Breitung, M. Wegener, and J. Aghassi-Hagmann |
Adv. Mater. Technol. 8, 2300893 (2023) |
6.10.2023 |
| Laser printed microelectronics | L. Yang, H. Hu, A. Scholz, F. Feist, G.C. Marques, S. Kraus, N.M. Bojanowski, E. Blasco, C. Barner-Kowollik, J. Aghassi-Hagmann, and M. Wegener |
Nat. Comm. 14, 1103 (2023) |
27.02.2023 |
| Activating Electroluminescence of Charged Naphthalene Diimide Complexes Directly Adsorbed on a Metal Substrate | V. Rai, L. Gerhard, N. Balzer, M. Valášek, C. Holzer, L. Yang, M. Wegener, C. Rockstuhl, M. Mayor, and W. Wulfhekel |
Phys. Rev. Lett. 130, 036201 (2023) |
18.01.2023 |
| In Situ Diagnostics and Role of Light-Induced Forces in Metal Laser Nanoprinting | L. Yang, A. Rahimzadegan, V. Hahn, E. Blasco, C. Rockstuhl, and M. Wegener |
Laser Photonics Rev. 2100411 (2022) |
22.01.2022 |
| Multi-material multi-photon 3D laser micro- and nanoprinting | L. Yang, F. Mayer, U.H.F. Bunz, E. Blasco, and M. Wegener |
Light: Adv. Manuf. 2, 17 (2021) |
21.06.2021 |
| Boosting Light Emission from Single Hydrogen Phthalocyanine Molecules by Charging | V. Rai, L. Gerhard, Q. Sun, C. Holzer, T. Repän, M. Krstić, L. Yang, M. Wegener, C. Rockstuhl, and W. Wulfhekel |
Nano Lett. (2020); doi:10.1021/acs.nanolett.0c03121 |
22.09.2020 |
| Sensitive Photoresists for Rapid Multiphoton 3D Laser Micro‐ and Nanoprinting | P. Kiefer, V. Hahn, M. Nardi, L. Yang, E. Blasco, C. Barner‐Kowollik, and M. Wegener |
Adv. Opt. Mater. 2000895 (2020) |
26.08.2020 |
| Influence of Co bilayers and trilayers on the plasmon-driven light emission from Cu(111) in a scanning tunneling microscope | K. Edelmann, L. Wilmes, V. Rai, L. Gerhard, L. Yang, M. Wegener, T. Repän, C. Rockstuhl, and W. Wulfhekel |
Phys. Rev. B 101, 205405 (2020) |
5.05.2020 |
| On the Schwarzschild Effect in 3D Two‐Photon Laser Lithography | L. Yang, A. Münchinger, M. Kadic, V. Hahn, F. Mayer, E. Blasco, C. Barner‐Kowollik, and M. Wegener |
Adv. Opt. Mater. 1901040 (2019) |
27.08.2019 |
