Abstract:

This paper presents a technology study for fabrication of “V”-shaped silver nanoantennas with critical dimensions below 20 nm. Two process sequences are investigated based on electron beam lithography, a lift off process using the positive resist polymethylmethacrylate (PMMA) and a novel process based on argon ion etching using the negative resist hydrogen silsesquioxane (HSQ). The fabrication processes are monitored by SEM investigations. Attenuated total reflection (ATR) measurements demonstrate the optical activity of the nanoantennas and allow the validation of the technology routes.